Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor
Patent
1987-04-27
1988-08-16
Schwartz, Larry I.
Drying and gas or vapor contact with solids
Apparatus
With means to treat gas or vapor
34114, 34122, 34155, F26B 700
Patent
active
047634243
ABSTRACT:
Disclosed is an apparatus and method for providing a shower of fog onto a web or a machine component in contact with a web or for applying a layer of moisture to a web. The fog, which as a temperature lower than the temperature of the surface of the web or the machine component to be cooled, is applied to the surface and is caused to evaporate by the difference in the temperatures. A supply of dry air is supplied to transport the evaporated fog from the region adjacent the surface to be cooled. Fog may be generated through the use of an air-atomizing nozzle which propels water and compressed air through a small orifice under pressure to create an atomized mist or fog. To achieve localized control of the application of fog, a plurality of air atomizing nozzles is mounted in a row extending in the cross machine direction of the apparatus. An air plenum extending parallel to the row of air atomizing nozzles is mounted on at least one side of the row. Each air plenum includes a slot that directs an air curtain toward the mist flow from the nozzle to restrict the flow to a uniformly dimensioned area.
REFERENCES:
patent: 2090267 (1937-08-01), Pulejo et al.
patent: 4689895 (1987-09-01), Taylor et al.
Hagen Kenneth G.
Taylor Bruce F.
Schwartz Larry I.
Thermo Electron-Web Systems, Inc.
LandOfFree
Apparatus and method for the control of web or web-production ma does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for the control of web or web-production ma, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for the control of web or web-production ma will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-592760