Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1995-03-07
1995-12-26
Bueker, Richard
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
216 66, 156345, H01L 21302
Patent
active
054784018
ABSTRACT:
An apparatus and method for surface treatment of a substance to be processed, which are capable of decreasing the number of foreign matters holding on the reverse side of the substance more than prior art like apparatus and method without largely decreasing a surface treating speed as compared with that of the prior art, by supplying ozone gas to the surface of the substance mounted on a supporting base. The supporting base has a heating part and a supporting part. There is provided a supporting material on the surface of the supporting part for partly supporting one side of the substance to be processed so that a required amount of gap may be formed between the substance to be processed and the supporting part. In the heating part is built a heater. And for a member constituting the supporting part is used a material having greater emissivity than a member constituting the heating part.
Funatsu Keisuke
Inada Akio
Kaku Masaro
Kawasumi Ken-ichi
Tsunekawa Sukeyoshi
Bueker Richard
Hitachi , Ltd.
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