Apparatus and method for supplying chemicals

Details Apparatus and method for supplying chemicals Apparatus and method for supplying chemicals

2005-04-05

2005-04-05

Sorkin, David (Department: 1723)

Agitating

Having specified feed means

Responsive to condition sensor

C137S391000

Reexamination Certificate

active

06874929

ABSTRACT:
A chemical supplying apparatus including first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a processing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.

REFERENCES:
patent: 2803441 (1957-08-01), Stewart et al.
patent: 3948490 (1976-04-01), Troope
patent: 4059929 (1977-11-01), Bishop
patent: 4242841 (1981-01-01), Ushakov et al.
patent: 4580699 (1986-04-01), Black et al.
patent: 5148945 (1992-09-01), Geatz
patent: 5409310 (1995-04-01), Owczarz
patent: 5502685 (1996-03-01), Orlando
patent: 5722447 (1998-03-01), Morgan et al.
patent: 5750440 (1998-05-01), Vanell et al.
patent: 5800056 (1998-09-01), Suzuki et al.
patent: 5803599 (1998-09-01), Ferri, Jr. et al.
patent: 5868278 (1999-02-01), Chen
patent: 5964231 (1999-10-01), Kight et al.
patent: 63-88029 (1988-04-01), None
patent: 1-128829 (1989-09-01), None
patent: 5-251423 (1993-08-01), None
patent: 9-29637 (1997-02-01), None
patent: 9-139334 (1997-05-01), None
patent: 9-290368 (1997-11-01), None
patent: 9602319 (1996-02-01), None

Affiliated with

Also associated with

Rating

Apparatus and method for supplying chemicals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for supplying chemicals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for supplying chemicals will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3386765