Apparatus and method for substrate temperature control

Details Apparatus and method for substrate temperature control Apparatus and method for substrate temperature control

1981-12-22

1983-08-02

Lusignan, Michael R.

Coating processes

Measuring, testing, or indicating

118666, 118725, 427 50, 427 51, 427 55, 427 74, B05D 306, B05D 314, B05D 512

Patent

active

043966403

ABSTRACT:
An apparatus and a method for controlling the temperature of a substrate onto which thin films of semiconductor materials are vapor deposited. The apparatus contains a platen contacting a surface of said substrate over the entire length of the deposition zone; said platen having at least one cavity therein and a rounded edge where said substrate first contacts said platen of the beginning of said deposition zone.

REFERENCES:
patent: 4104420 (1978-08-01), Jordan et al.
patent: 4224355 (1980-09-01), Lampkin et al.

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