Coating apparatus – With means to centrifuge work
Patent
1993-08-30
1995-12-05
Simmons, David A.
Coating apparatus
With means to centrifuge work
118 56, 118 58, 118 63, 427348, B05C 1102
Patent
active
054725020
ABSTRACT:
An apparatus and method are provided for controlling the rate of drying of a high-viscosity chemical applied to a substantially flat surface of a spinning article. The rate of drying of the chemical is controlled by controlling the saturation level of a solvent in the local atmosphere in which the article is spinning, i.e., in the air space adjacent to the surface of the article. By spinning the article in a solvent-laden vapor, the evaporation of solvent from the chemical is slowed and therefore the rate at which the chemical dries and thickens is also slowed. Spreading of the chemical may also be facilitated and premature drying of the chemical may be avoided by applying to the surface of the article a thin layer of the solvent prior to application of the chemical.
REFERENCES:
patent: 5013586 (1991-05-01), Cavazza
patent: 5158860 (1992-10-01), Gulla et al.
patent: 5238713 (1993-08-01), Sago et al.
Van Zant, Peter, "Microchip Fabrication. A Practical Guide to Semiconductor Processing." Published, 1986 by Semiconductor Services, San Jose, Calif., pp. 116-117.
Wolf, Stanley Ph.D and Tauber, Richard N. Ph.D., Silicon Processing For The VLSI Era, vol. 1: Process Technology, published by Lattice Press, Calif., pp. 429-430.
Rivard Paul M.
Semiconductor Systems, Inc.
Simmons David A.
Steuber David E.
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