Apparatus and method for simulating phenomena of a particle...

Data processing: structural design – modeling – simulation – and em – Simulating nonelectrical device or system

Reexamination Certificate

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C703S012000

Reexamination Certificate

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08889440

ABSTRACT:
An apparatus and method for simulating phenomena of a combined particle formed of substrate particles and adsorbate particles. The simulated phenomena can include, for example, crystal growth, crystal surface adsorption and surface damage. The apparatus includes a kinetic condition setting unit and a particle motion computing unit. The kinetic condition setting unit sets information for defining kinetic conditions of the adsorbate particles. The particle motion computing unit generates the adsorbate particles in accordance with the information set by the kinetic condition setting unit and computes motion of the generated adsorbate particles, to simulate phenomena of the combined particle.

REFERENCES:
patent: 4370176 (1983-01-01), Bruel
patent: 5421934 (1995-06-01), Misaka et al.
patent: 5602418 (1997-02-01), Imai et al.
patent: 5714006 (1998-02-01), Kizuki et al.
patent: 5751607 (1998-05-01), Ohta
F. H. Baumann et al., “3D Modeling of Sputter and Reflow Processes for Interconnect Metals,” IEDM 95, p. 4.4.1-4.4.4, 1995.
T. Takagi, “Development of New Materials by Ionized-Cluster Beam Technique,” Mat. Res. Soc. Symp. Proc. vol. 27, p. 501-511, 1987.
H. M. Jones et al., “Monte Carlo Investigation of Electron-Imapct Ionization in Liquid Xenon,” Phys. Rev. B, vol. 48, p. 9382-9387, 1993.
Printout from internet: Cornell Theory Center; A Dynamic Brittle-Ductile Transition in a Simulation of 100 Million Atoms; 10 hand numbered pages, 1996.
Printout from internet: XSIMBAD Version 2.0; hand numbered pp. 1-12, 1996.
Kinema/SDK—Programmer's Reference Manual: ArSciMed; chapters 1-10, 1996.
Bouvier et al.; “From crowd simulation to airbag deployment: particle systems, a new paradigm of simulation”; J. of Electronic Imaging; pp. 94-107, Jan. 1997.
Yamada et al.; “A sputter equipment simulation system including molecular dynamical target atom scattering model”; IEEE-IEDM 95; pp. 4.5.1 to 4.5.4, 1995.
Cohen; “Computer animations, quantum mechanics and elementary particles”; Europhys. News; pp. 163-166, 1992.
Reeves; “Particle systems-a technique for modeling a class of fuzzy objects”; ACM Trans. Graphics; pp. 359-376, 1983.
Husinsky et al.; “Fundamental aspects of SNMS for thin film characterization: experimental studies and computer simulations”; Thin Solid Films; pp. 289-309, Jan. 1996.
Printout of “ewals3.F90” from Appellants' CD ROM (p. 2, paper # 36); pp. 1-8.
Printout of “TABLEM—Cell” from Appellansts' CD ROM (p. 2, paper # 36); pp. 1-6.
Screenshots of CD ROM directory and attempts to open “F90” files (Appellants's CD ROM; p. 2, paper # 36); pp. 1-3.
Appellants' Assignee's website—Google search; one page.
Printout from Assignee's webpage (Cache Group)—two pages.
Printout from Assignees's website—“Materials Explorer”—see p. 4, par. 3, paper # 34; two pages.
“Materials Explorer” (Parts 1-3); pp. 1-196; pp. 1-38; pp. 1-37, respectively; 2001; Printed from Appellants' website.
“Molecular-dynamics simulations for molecular-beam epitaxy: Overlayer growth pattern in two-component Lennard-Jones systems”, published in The American Physical Society, pp. 9476-9485 (1989).
“Molecular-Dynamics Simulations of Hydrogenated Amorphous Silicon Thin-Film Growth”, presented at the Fall Meeting of the Materials Research Society, Boston, MA, Nov. 27-Dec. 1, 1995.

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