Apparatus and method for selectively exposing photosensitive...

Details Apparatus and method for selectively exposing photosensitive... Apparatus and method for selectively exposing photosensitive...

2005-07-05

2005-07-05

Sugarman, Scott J. (Department: 2873)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C359S261000

Reexamination Certificate

active

06914708

ABSTRACT:
An exposure apparatus (8) for fabricating optical film (40) by exposing a pattern such as for photoalignment, where the optical film (40) has a photosensitive layer (20) and a substrate (10). The exposure apparatus (8) directs an exposure beam from a light source (1) to a reflective polarization modulation device (88). The modulated exposure beam is then directed onto the photosensitive layer (20) for forming a pattern onto the optical film (40). A reflective surface (50) is disposed to reflect, back through the optical film (40), a portion of the exposure beam transmitted through the optical film (40), in order to obtain a photoreactive response. The source of exposure radiation and the reflective surface (50) are on opposite sides of the optical film (40).

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