Apparatus and method for selective area deposition of thin films

Details Apparatus and method for selective area deposition of thin films Apparatus and method for selective area deposition of thin films

1994-08-05

1999-06-08

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

With treating means

118723CB, 20429805, 20429806, C23C 1604, C23C 1404

Patent

active

059102209

ABSTRACT:
An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.

REFERENCES:
patent: 5254417 (1993-10-01), Wada

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