Apparatus and method for replacing an attachment on a vacuum cha

Details Apparatus and method for replacing an attachment on a vacuum cha Apparatus and method for replacing an attachment on a vacuum cha

1998-12-03

2000-07-04

Jacyna, J. Casimer

Fluent material handling, with receiver or receiver coacting mea

Processes

Gas or variation of gaseous condition in receiver

141 65, 141 98, 137 15, F17D 300

Patent

active

06082414&

ABSTRACT:
An apparatus and a method for replacing an attachment device on a vacuum chamber is disclosed. The apparatus is constructed by the major component of two shut-off valves, a rough vacuum pump, and a pressure gauge. The attachment replacement apparatus can be advantageously connected between an attachment, such as a vacuum gauge or a flow control valve and the vacuum chamber. By utilizing the present invention novel apparatus, the down time required for replacing an attachment device on the vacuum chamber can be drastically reduced by at least 90%. For instance, only a 10 minutes down time is required by utilizing the present invention novel apparatus when compared to the conventional method which requires a 10.about.30 hour pump-down time for resuming vacuum in a chamber that has broken vacuum. The present invention novel apparatus can be used in conjunction with any type of vacuum chambers, i.e., one utilized in a physical vapor deposition chamber, in a chemical vapor deposition chamber, in an ion implanter or in an etcher as long as a high vacuum state in the chamber is required.

REFERENCES:
patent: 3591827 (1971-07-01), Hall
patent: 4655048 (1987-04-01), Burg
patent: 5405572 (1995-04-01), DeVolk
patent: 5488967 (1996-02-01), Minami et al.
patent: 5968588 (1999-10-01), Sivaramakrishnan et al.

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