Gas separation: processes – Liquid contacting
Reexamination Certificate
2001-09-06
2004-07-27
Smith, Duane S. (Department: 1724)
Gas separation: processes
Liquid contacting
C096S271000, C096S273000, C096S320000
Reexamination Certificate
active
06767387
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the invention
This invention relates to a gas treatment device. More particularly, this invention relates to a device for removing particles from a gas expelled during heat treatment process.
2. Description of Prior Art
Referring to
FIG. 1
, a gas treatment device
1
comprises an oxygen-mixed unit
11
, a treatment unit
12
, a first cooling/cleaning unit
13
and a second cooling/cleaning unit
14
. The oxygen-mixed unit
11
is disposed at the upstream region of the treatment unit
12
and connected to equipment, for example, a semiconductor-processing device (not shown in figure) via a pipe
41
. The pipe
41
transmits exhaust gas expelled from the semiconductor-processing device to the treatment unit
12
so as to proceed a series of heat treating steps. The first cooling/cleaning unit
13
and the second cooling/cleaning unit
14
are sequentially disposed in the exit of the treatment unit
12
, and the first cooling/cleaning unit
13
is connected to the second cooling/cleaning unit
14
through a tube
43
. By mixing with oxygen from the oxygen-mixed unit
11
, lots of particles, i.e., oxidation, are generated within the treatment unit
12
. The two cooling/cleaning unit
13
,
14
are then used for proceeding a series of cooling and cleaning steps on the gas expelled from the treatment unit
12
.
In the first cooling/cleaning unit
13
, a sprayer
2
connected with a pipe
21
is provided. The sprayer
2
comprises a plurality of nozzles
22
disposed on the pipe
21
and located at the path of the gas expelled from the treatment unit
12
. As a working fluid is transmitted into the sprayer
2
and outputted by the nozzles
22
, particles in the gas can be immediately cooled and fallen down.
However, the fallen particles are gradually formed cakes stuck on the inner wall of the pipe
43
with the time, and it is inconvenient for cleaning the cakes by taking apart the pipe
43
from the other related elements in the gas treatment device
1
. Further, the pipe
21
connected to the sprayer
2
is located at the exit of the treatment unit
12
, and the pipe
21
is easily deformed by the expelled gas with high temperature.
FIG. 2
is a plan view showing a sprayer
3
according to another prior art, and the sprayer
3
also can be applied in the cooling/cleaning unit
13
.
The sprayer
3
comprises a pipe
31
and a conical head
32
connected to the pipe
31
. The conical head
31
is formed with openings used as nozzles for spraying water transmitted by the pipe
31
. Although the particles in the gas can be removed by the spraying water from the conical head
32
, but the pipe
31
and the conical head
32
located at the exit of the treatment unit
12
is also deformed by the expelled gas with high temperature.
SUMMARY OF THE INVENTION
To solve the above problem, the primary object of this invention is to provide a gas treatment device with a sprayer so as to remove particles from a gas expelled during a treatment process. The gas treatment device comprises a treatment unit, a working fluid and a sprayer. The treatment unit is used for proceeding heat treatment process and certainly producing a gas containing harmful particles. The gas is expelled out of the treatment unit and flowing along a path such as a pipe. The sprayer has a hollow body provided with an inner wall and a plurality of nozzles circumferentially arranged on the inner wall. The nozzles are used for outputting the working fluid to form a filtering region in the path and the working fluid outputted from the nozzles are individually reached to the inner wall, so that the particles can be easily and efficiently removed from the gas.
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Ladas & Parry
Nanya Technology Corporation
Smith Duane S.
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