Coating apparatus – Work surface shields – masks or protectors – Work-attached
Patent
1986-11-14
1990-04-10
Beck, Shrive
Coating apparatus
Work surface shields, masks or protectors
Work-attached
118721, B05C 1302
Patent
active
049150570
ABSTRACT:
An apparatus and method for registration or alignment of thin film structure patterns on a substrate formed with the use of an apertured mask in a vacuum deposition system. On particular the alignment apparatus is comprised of a mask holder assembly, which supports the apertured mask, and a substrate carrier which engages with the holder assembly. Upon placing the engaged alignment apparatus in a a deposition chamber, a magnet is positioned adjacent the holder assembly in order to formly hold the apertured mask against a substrate prior to vacuum to deposition. Upon depositing the pattern material, the magnet and holder assembly are disengaged, resulting in a pattern of thin film structures remaining on the substrate. The present invention is effective for remotely operating automatic masking systems where there is a need to eliminate the need for breaking vacuum in a deposition system.
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F. W. Ingle, "A Shadow Mask for Sputtered Films", Rev. Sci. Instr. 45 (1974) pp. 1460-1461.
Boudreau Robert A.
Wilkie Robert J.
Bashore Alain
Beck Shrive
Finnegan Martha Ann
GTE Products Corporation
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