Apparatus and method for reducing contamination in immersion...

Details Apparatus and method for reducing contamination in immersion... Apparatus and method for reducing contamination in immersion...

2006-01-27

2008-11-04

Lee, Diane I. (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S075000, C355S053000

Reexamination Certificate

active

07446859

ABSTRACT:
An apparatus for reducing contamination in immersion lithography includes a wafer chuck assembly having a wafer chuck configured to hold a semiconductor wafer on a support surface thereof. The wafer chuck has a gap therein, the gap located adjacent an outer edge of the wafer, and the gap containing a volume of immersion lithography fluid therein. A fluid circulation path is configured within the wafer chuck so as to facilitate the radial outward movement of the immersion lithography fluid in the gap, thereby maintaining a meniscus of the immersion lithography fluid at a selected height with respect to a top surface of the semiconductor wafer.

REFERENCES:
patent: 6781670 (2004-08-01), Krautschik
patent: 6788477 (2004-09-01), Lin
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2005/0122505 (2005-06-01), Miyajima
patent: 2005/0123863 (2005-06-01), Chang et al.
patent: 2005/0168713 (2005-08-01), Vogel et al.
patent: 2005/0237501 (2005-10-01), Furukawa et al.
patent: 2005/0259236 (2005-11-01), Straaijer

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