Apparatus and method for recovering photoresist developers and s

Details Apparatus and method for recovering photoresist developers and s Apparatus and method for recovering photoresist developers and s

1996-10-23

1998-05-19

Powell, William

Etching a substrate: processes

Nongaseous phase etching of substrate

Recycling, regenerating, or rejunevating etchant

156345, B44C 122

Patent

active

057531358

ABSTRACT:
In a developing, etching and stripping apparatus, photoresist developing and stripping chemicals are drawn off into separate circulatory paths in each of which they are pumped through a heat exchanger, a series of tangential filters, an ultraviolet contactor and a collection tank. Permeate from the filters is returned to the developing or stripping stage, and solutions with high concentrations of solids are removed from the collection tanks for disposal.

REFERENCES:
patent: 4069157 (1978-01-01), Hoover et al.
patent: 4865742 (1989-09-01), Falletti
patent: 4982215 (1991-01-01), Matsuoka
patent: 5112491 (1992-05-01), Strantz, Jr.
patent: 5205937 (1993-04-01), Bhave et al.
patent: 5531889 (1996-07-01), Baron et al.

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