Apparatus and method for recovering liquid droplets in...

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Reexamination Certificate

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C355S030000

Reexamination Certificate

active

07929109

ABSTRACT:
Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.

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Shedd et al., “Experimental characterization of the receding meniscus under conditions associated with immersion lithography”, Mar. 16, 2006, Proc. SPIE 6154, 61540R, DOI:10.1117/12.658894.

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