Apparatus and method for rapid thermal processing

Details Apparatus and method for rapid thermal processing Apparatus and method for rapid thermal processing

1997-01-08

1999-02-16

Nappi, Robert

Electric resistance heating devices

Heating devices

Radiant heater

392416, 29 2501, 118715, 427586, 427595, C23C 1600

Patent

active

058728899

ABSTRACT:
A closable enclosure for rapid thermal processing of semiconductor wafers is presented, wherein the closable enclosure has an enclosed volume less than 10 times the volume of the wafer, and wherein the closable enclosure may be closed about the wafer while the closable enclosure is surrounded by the process gas.

REFERENCES:
patent: 4365588 (1982-12-01), Jolly
patent: 4794217 (1988-12-01), Quan et al.
patent: 4855160 (1989-08-01), Luttmer et al.
patent: 5011794 (1991-04-01), Grim et al.
patent: 5060354 (1991-10-01), Chizinsky

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