Apparatus and method for providing fluid for immersion...

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Reexamination Certificate

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C355S030000

Reexamination Certificate

active

08054448

ABSTRACT:
An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity in a direction that is different than a direction in which the nozzle moves. The immersion fluid can also be injected at different rates into the inner cavity at different sides. A wafer substrate is then exposed by light through the immersion fluid.

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