Apparatus and method for profiling a beam

Optics: measuring and testing – Lamp beam direction or pattern

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4251744, 264 22, G01J 100, B28B 1700

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active

052670139

ABSTRACT:
An apparatus and a method for profiling the intensity of a beam and thus measuring the overall intensity and power of a beam are disclosed that have particular use in stereolithography. A beam sensor comprising a pinhole in a plate and a photodetector behind the pinhole measures the intensity of portions of a beam as the beam is moved over the beam sensor. Software associated with the sensors in a computer controls the scanning mechanism for the beam so that the beam is shifted to find the pinhole and move across it in order to develop the intensity profile. The invention can be used to detect drift in the scanning mechanism, determine the focus of the beam, and predict the depth and width of photopolymer cured by the beam.

REFERENCES:
patent: 4575330 (1986-03-01), Hull
patent: 4585342 (1986-04-01), Lin et al.
patent: 4660981 (1987-04-01), Stridsberg
patent: 4695722 (1987-09-01), Motooka
patent: 4745280 (1988-05-01), Gi et al.
patent: 4752498 (1988-06-01), Fudim
patent: 4799791 (1989-01-01), Echizen et al.
patent: 4929402 (1990-05-01), Hull
patent: 4945032 (1990-07-01), Murphy
patent: 5058988 (1991-10-01), Spence
patent: 5059021 (1991-10-01), Spence et al.
patent: 5123734 (1992-06-01), Spence et al.
Applied Optics, vol. 17, No. 17, Sep. 1978, pp. 2673-2674; P. J. Shalyer: "Laser Beam Distribution In the Focal Region", (see FIG. 1, p. 1).
Abstract of JP 62-163933 (Nippon Kogaku K.K.) Jul. 20, 1987.

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