Apparatus and method for profiling a beam

Optics: measuring and testing – Lamp beam direction or pattern

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4251744, 264 22, G01J 100

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active

050589881

ABSTRACT:
An apparatus and a method for profiling the intensity of a beam and thus measuring the overall intensity and power of a beam are disclosed that have particular use in stereolithography. A beam sensor comprising a pinhole in a plate and a photodetector behind the pinhole measures the intensity of portions of a beam as the beam is moved over the beam sensor. Software associated with the sensors in a computer controls the scanning mechanism for the beam so that the beam is shifted to find the pinhole and move across it in order to develope the intensity profile. The invention can be used to detect drift in the scanning mechanism, determine the focus of the beam, and predict the depth and width of photopolymer cured by the beam.

REFERENCES:
patent: 4575330 (1986-03-01), Hull
patent: 4585342 (1986-04-01), Lin et al.
patent: 4660981 (1987-04-01), Stridsberg
patent: 4695722 (1987-09-01), Motooka
patent: 4745280 (1988-05-01), Gi et al.
patent: 4752498 (1988-06-01), Fudim
patent: 4799791 (1989-01-01), Echizen et al.
patent: 4929402 (1990-05-01), Hull
patent: 4945032 (1990-07-01), Murphy
"Automatic Method for Fabricating a Three-Dimensional Plastic Model with Photo-Hardening Polymer," by Hideo Kodama, vol. 52, No. 11, Nov. 1981, pp. 1770-1773.
"A new Method of Three-Deminsional Michomachining," by Efrem Fudim, Mechanical Engineering, Sep. 1985, pp. 54-59.
"Photopolymerization of Photopolymers by Scanning Laser Beam," by Takashi Nakai and Yaji Maratami, Reiza Kenkyu, vol. 16, No. 1, pp. 14-22, Jan. 1988.

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