Apparatus and method for processing a microelectronic...

Optics: measuring and testing – Dimension – Thickness

Reexamination Certificate

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C438S005000, C438S007000, C438S014000, C438S016000, C205S081000, C205S084000, C204S228700

Reexamination Certificate

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10685306

ABSTRACT:
A processing apparatus for processing a microelectronic workpiece includes a metrology unit and a control, signal-connected to the metrology unit. The control can modify a process recipe or a process sequence of the processing apparatus based on a feed forward or a feed back signal from the metrology unit. A seed layer deposition tool, a process layer electrochemical deposition tool, and a chemical mechanical polishing tool, arranged for sequential processing of a workpiece, can be controlled as an integrated system using one or more metrology units. A metrology unit can be located at each tool to measure workpiece parameters. Each of the metrology units can be used as a feed forward control and/or a feed back control at each of the tools.

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International Search Report for International Application No. PCT/US01/21579 mailed Nov. 16, 2001; Applicant: Semitool, Inc. 3 pgs.

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