Apparatus and method for processing a base substance using plasm

Details Apparatus and method for processing a base substance using plasm Apparatus and method for processing a base substance using plasm

1994-10-11

1998-01-13

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

427572, 427535, 427571, 216 71, 118723E, 118723ER, 118723I, 118723IR, B05D 300, H05H 102, C23C 1400

Patent

active

057076928

ABSTRACT:
A plasma processing apparatus for processing a base substance installed within a processing chamber into which predetermined gases are flowed and which is maintained at a predetermined pressure by producing a plasma within said processing chamber is characterized by comprising plasma producing means for producing the plasma within said processing chamber including at least two ground electrodes provided on external peripheries of said processing chamber, and an rf electrode provided on external periphery of said processing chamber between said two ground electrodes, and magnetic field producing means for producing a magnetic field orthogonal to an electric field formed by said plasma producing means.

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