Apparatus and method for process monitoring

Details Apparatus and method for process monitoring Apparatus and method for process monitoring

2007-05-15

2007-05-15

Sines, Brian (Department: 1743)

Chemical apparatus and process disinfecting, deodorizing, preser

Analyzer, structured indicator, or manipulative laboratory...

Means for analyzing liquid or solid sample

C422S050000, C422S052000, C422S051000, C422S067000, C422S062000, C422S063000, C422S069000, C422S073000, C422S081000, C422S082000, C422S082010, C422S082020, C422S082030, C422S105000, C422S082080, C422S082090, C422S091000, C422S105000, C422S105000, C422S105000, C422S105000, C073S001010, C073S001020, C073S053010, C436S043000, C436S052000, C436S053000, C436S063000, C436S066000, C436S149000, C436S167000, C436S172000, C436S164000, C436S165000, C436S171000

Reexamination Certificate

active

10845767

ABSTRACT:
An apparatus is provided for testing fluid samples includes a sensor, which can be light source, directed to a flow cell and a photo sensor for detecting a light beam reflected from the flow cell. The photo sensor monitors the fluid in the flow cell by sensing the reflected light beam from the flow cell, thereby monitoring the test.

REFERENCES:
patent: 4222744 (1980-09-01), McConnell
patent: 5965456 (1999-10-01), Malmqvist et al.
patent: 6002475 (1999-12-01), Boyd et al.
patent: 6218719 (2001-04-01), Tsang
patent: 6222619 (2001-04-01), Herron et al.
patent: 6228652 (2001-05-01), Rodriguez et al.
patent: 6326612 (2001-12-01), Elkind et al.
patent: 6524858 (2003-02-01), Zelmanovic et al.
patent: 6592822 (2003-07-01), Chandler
patent: 6611634 (2003-08-01), Herron et al.
patent: 6692696 (2004-02-01), Alberte
patent: 2002/0128234 (2002-09-01), Hubbell et al.

Affiliated with

Also associated with

Rating

Apparatus and method for process monitoring does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for process monitoring, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for process monitoring will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3789954