Apparatus and method for preventing contamination of sputtering

Details Apparatus and method for preventing contamination of sputtering Apparatus and method for preventing contamination of sputtering

1979-11-28

1981-10-13

Gantz, Delbert E.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

042946786

ABSTRACT:
A sputtering apparatus which includes a vessel that is designed to be evacuated and sealed from the ambient atmosphere during its use in sputtering target material from targets that are mounted to be exposed to the interior of the vessel is provided with a shutter system that isolates the exposed target surfaces from the interior of the vessel when the vessel is opened. In this way the target material is closed off from the ambient atmosphere which of necessity enters into the interior of the vessel when it is opened to be serviced.
Each target is recessed into a chamber which is formed in the wall of the vessel, the chamber having an entrance opening to the interior of the vessel and, when open, exposing the active target surfaces to the interior of the vessel. A remotely controlled shutter is slid across the entrance of the chamber to seal the same from the vessel interior when desired.

REFERENCES:
patent: 3827966 (1974-08-01), Needham
patent: 3911579 (1975-10-01), Lane et al.
patent: 3976555 (1976-08-01), Von Hartel
J. Vossen and W. Kern, Editors, Thin Film Processes, Academic Press, New York, 1978, pp. 31-42.
A. Buchman et al., "Contamination Free Sputtering", IBM Technical Disclosure Bulletin, vol. 15, No. 6, (Nov. 1972), p. 1818.

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