Apparatus and method for preventing chamber contamination

Details Apparatus and method for preventing chamber contamination Apparatus and method for preventing chamber contamination

1998-08-28

2000-12-19

Chambers, A. Michael

Fluid handling

With means for separating solid material from the fluid

Sediment chamber

13756501, 137613, 137571, 251326, 118715, C25C 1600

Patent

active

061615757

ABSTRACT:
An apparatus and a method for providing fluid communication between a process chamber and a dry pump without contamination problem are disclosed. The apparatus utilizes a conduit that has at least one gate valve installed therein for opening or closing the conduit and a T-shaped cold trap to collect large size contaminating particles. The present invention apparatus is effective in preventing particle contamination to the process chamber by a siphoning or backsteam effect when a dry pump failure occurs. While the present invention apparatus and method may be used in any deposition process which produces reaction by-products, or contaminating particles, it is particularly suitable for use in a TEOS oxide deposition process.

REFERENCES:
patent: 21765 (1858-10-01), Mallerd
patent: 1177621 (1916-04-01), Hauk
patent: 4406304 (1983-09-01), Vamvakas
patent: 4655800 (1987-04-01), Tsukada et al.
patent: 5904757 (1999-05-01), Hayashi et al.
patent: 6015463 (2000-01-01), Cox

Affiliated with

Also associated with

Rating

Apparatus and method for preventing chamber contamination does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for preventing chamber contamination, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for preventing chamber contamination will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-263682