Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents
Reexamination Certificate
1999-09-10
2001-05-15
Coe, Philip R. (Department: 1746)
Cleaning and liquid contact with solids
Processes
Using sequentially applied treating agents
C134S083000, C134S105000
Reexamination Certificate
active
06231684
ABSTRACT:
FIELD OF THE INVENTION
The present invention generally pertains to process part precision cleaning and drying apparatus and methods. Specifically, the invention relates to cleaning and drying systems using a wide variety of solvents or liquids and implements various cooperative structures and processes to reduce solvent or other cleaning material consumption while enhancing cleaning and drying efficiencies of the systems.
BACKGROUND OF THE INVENTION
Cleaning systems utilize solvents or other aqueous mixtures for cleaning and drying of process parts. Most of the currently available systems are uneconomical because they lack adequate means for controlling solvent carry-off and evaporation. Typically, this results in high solvent consumption and energy dissipation in addition to undesirable emissions and discharge into the environment.
Additional concerns relate to loss of other cleaning system fluids or materials, whether solvent-based or not. In these systems there is a similar need to obviate such losses.
Accordingly, there is a need for an energy efficient and environmentally sound system to clean and dry process parts.
SUMMARY OF THE INVENTION
The present invention provides a structure and process to precisely and efficiently clean and dry process parts. The system is preferably designed for use with universally accepted cleaning solvents including but not limited to HFCs, HCFCs, HFEs, PFCs and other non-CFC, non-flammable solvents and low flash point solvents such as isopropyl alcohol and cyclohexane, although non-solvent uses apply as well. The system combines unique structural, mechanical and electronic components integrated with Programmable Logic Controllers (PLCs) and processes to provide a distinct advantage over the prior art.
The system is adapted for cleaning and drying and removal of contaminants from various process parts. For example, contaminants from PC boards, hybrid circuits, MCMs, C4 packages, disk drive components, precision mechanical and electromechanical components, optical instruments and medical devices may be effectively removed using the present invention.
Specifically, the present invention not only enables the use of a wide range of different solvents but also reduces cleaning and drying media consumption through the use of a full sealed upper enclosure and a highly specialized chamber known as the LOAD LOCK™ chamber or LOADLOCK™ process.
In one embodiment, Isopropyl alcohol (IPA) is used for the removal of water, particle contamination and organic films including oils and greases. In yet another embodiment cyclohexane is used to remove particle contamination and organic films including oils and greases. Further, in another embodiment alcohol/cyclohexane azeotrope is used to remove most contaminants including activated fluxes. In yet another embodiment, solvents such as n Pb, and many of the new CFC-replacing solvents-, along with acetone and volatile methyl siloxanes may be used. Alternate embodiments include systems useful as vapor dryers and wet benches, for example.
REFERENCES:
patent: 4485761 (1984-12-01), Stewart
patent: 4558524 (1985-12-01), Peck et al.
patent: 4736758 (1988-04-01), Kusuhara
patent: 4902350 (1990-02-01), Steck
patent: 4983223 (1991-01-01), Gessner
patent: 2024363 (1980-01-01), None
Bartell Matthew
Honeck Randy
Mouser Wayne
Coe Philip R.
Forward Technology Industries, Inc.
Patterson Thuente, Skaar & Christensen, PA
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