Apparatus and method for precise lapping of recessed and...

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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C029S603130, C029S603140, C029S603150, C029S603160, C029S603180, C216S088000, C216S089000, C438S692000, C438S693000, C451S005000, C451S028000, C451S041000

Reexamination Certificate

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06935013

ABSTRACT:
A lapping method utilizing textured and conditioned lapping plates most suitable for finishing magnetic heads resulting in improved surface quality, less sensitivity to electrical shorts due to smears, and reduced surface height difference between the head elements exposed at the slider air bearing surface. A rough lapping phase is followed by a polishing phase that maintains the same mechanical motion between the work piece and lapping plate but utilizes only the lapping plate without abrasives of any kind to polish the work piece surface, and to clean up any deep textured marks resulting from the diamond slurry phase. A conductive liquid is utilized to provide lubrication and to minimize static charge.

REFERENCES:
patent: 4866886 (1989-09-01), Holmstrand
patent: 5603156 (1997-02-01), Biskeborn et al.
patent: 5968238 (1999-10-01), Healy et al.
patent: 5981396 (1999-11-01), Robinson et al.
patent: 6050879 (2000-04-01), Dubrovskiy et al.
patent: 6383239 (2002-05-01), Suzuki et al.
patent: 6444132 (2002-09-01), Orii et al.
patent: 402075780 (1990-03-01), None
“Effect of crystal orientation on lapping and polishing processes of natural quartz”; Guzzo, P.L.; De Mello, J.D.B.; Ultrasonics, Ferroelectrics and Frequency Control, 5 , Sep. 2000; pp.: 1217-1227.

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