Apparatus and method for polishing workpiece

Details Apparatus and method for polishing workpiece Apparatus and method for polishing workpiece

1995-09-13

1997-10-07

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451285, 451286, 451287, 451288, 451289, 451290, B24B 100

Patent

active

056741090

ABSTRACT:
A polishing apparatus has a circular abrasive cloth on a turntable, and a top ring for holding a workpiece and pressing the workpiece against the circular abrasive cloth to polish the workpiece while the circular abrasive cloth is rotated about a center axis and the workpiece is rotated by the top ring about a top ring axis located at a positioned spaced from the center axis. The position is spaced from the center axis by a distance rc, and the workpiece has a radius rw. When the workpiece is not angularly moved with respect to the circular abrasive cloth wile the workpiece is being polished, a ratio Rc=rc/rw is in a range from 1.10 to 2.60. When the workpiece is angularly moved at a radius rs through an angular displacement .o slashed. (degrees) in arcuate reciprocating motions with respect to the circular abrasive cloth, a ratio Rs=rs/rw, the angular displacement .o slashed., and the ratio Rc are selected to be of a certain relationship.

REFERENCES:
Surfacetech Review, vol. 1, Issue 9, Aug. 1990, "A Study of Polishing Pad Dynamics".

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