Apparatus and method for polishing workpiece

Details Apparatus and method for polishing workpiece Apparatus and method for polishing workpiece

1996-04-10

1997-07-29

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

457285, 457286, 457287, 457288, 457444, 457 57, B24B 100, B24B 719, B24B 730

Patent

active

056517254

ABSTRACT:
An apparatus and method for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The workpiece is held by a top ring, and a surface of the workpiece is polished by pressing the workpiece against an abrasive cloth mounted on a turntable while applying an abrasive solution onto the abrasive cloth. While the workpiece is being polished, a surface of the abrasive cloth is dressed while applying a dressing liquid onto the abrasive cloth. A polishing operation and a dressing operation are performed in such a state that the abrasive solution and the dressing liquid do not interfere with each other.

REFERENCES:
patent: 5384986 (1995-01-01), Hirose et al.
patent: 5456327 (1995-10-01), Jackson et al.
patent: 5486131 (1996-01-01), Cesna et al.
patent: 5536202 (1996-07-01), Appel et al.

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