Apparatus and method for plasma-processing

Details Apparatus and method for plasma-processing Apparatus and method for plasma-processing

1996-05-22

1997-12-09

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

118728, 427573, C23C 1600

Patent

active

056955669

ABSTRACT:
In a plasma processing apparatus having an upper electrode and a lower electrode in a vacuum chamber, a substrate receiving face of the lower electrode is formed to have a same convex surface as a deflected face of a substrate on condition that surface of the substrate is freely supported on an circumference thereof, and a uniform pressure is applied to the back of the substrate.

REFERENCES:
patent: 4842683 (1989-06-01), Cheng et al.
patent: 4931135 (1990-06-01), Horiuchi et al.
patent: 4978412 (1990-12-01), Aoki et al.
patent: 5013400 (1991-05-01), Kurasaki et al.
patent: 5096536 (1992-03-01), Cathey, Jr.
patent: 5494522 (1996-02-01), Moriya et al.
patent: 5494523 (1996-02-01), Steger et al.

Affiliated with

Also associated with

Rating

Apparatus and method for plasma-processing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for plasma-processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for plasma-processing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1604255