Apparatus and method for patterning a film

Optical: systems and elements – Single channel simultaneously to or from plural channels – By surface composed of lenticular elements

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359626, 136246, 136259, 21912167, 21912175, 21912177, 21912185, 428209, 428344, 428354, 430 5, 430 14, 430 22, 430270, 430396, 430495, 430946, G02B 2700, H01L 3100, B23K 2600, G03F 900

Patent

active

052165434

ABSTRACT:
The present invention relates to an apparatus and method for patterning areas of a radiation absorbent film material. In the preferred embodiment, the film material is at least partially electrically conductive. The radiation is focused onto the film by a lenticular lens having a plurality of optically active elements to provide a radiation pattern on the film and remove or displace portions of the film to form a corresponding pattern, preferably a conductive pattern. The film may have one or more layers or regions, but at least one region must be radiation absorbent in order to allow the formation of patterns in the film in accordance with the present invention. The areas of the film affected by the phenomenon of radiation absorption are non-conductive voids which may separate the film into a plurality of conductive grid lines whereby the film is useful with a conductive lens film to increase the apparent efficiency of a photovoltaic cell.

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Document received from Entech, Inc.

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