Data processing: generic control systems or specific application – Specific application – apparatus or process – Article handling
Patent
1997-12-29
2000-01-18
Teska, Kevin J.
Data processing: generic control systems or specific application
Specific application, apparatus or process
Article handling
39550009, 700 96, 700 97, 430 5, 430 30, G06F 1750, G06F 1900, G03F 902
Patent
active
060163917
ABSTRACT:
A computerized method (20, 60) for optimizing chip size/aspect ratio and reticle layout. The method includes the steps of first generating an initial rectangular shot map (22, 62) having a number of rows and columns of shots, determining which chips in the initial rectangular shot map are geometrically positioned on acceptable areas of a wafer, determining which chips in the initial rectangular shot map are geometrically positioned on low and high yield locations of the wafer, and deleting the empty shots from the initial rectangular shot map for obtaining a temporary best shot map. Thereafter, iteratively shifting the initial rectangular shot map along a first axis until a first predetermined limit is reached, comparing each resultant shifted shot map with the temporary best shot map, and setting the shifted shot map as the temporary best shot map in response to a favorable comparison. After the first predetermined limit is reached, iteratively shifting the initial shot map along a second axis until a second predetermined limit is reached, comparing each resultant shifted rectangular shot map with the temporary best shot map, and setting the shifted shot map as the temporary best shot map in response to a favorable comparison. A best shot map (100, 110) is then generated for wafer fabrication. The chip size is also optimized by a companion method.
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Facchini Angelo
Serapiglia Antonio
Donaldson Richard L.
Kik Phallaka
Laws Gerald E.
Marshall, Jr. Robert D.
Teska Kevin J.
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