Apparatus and method for optimizing a pellicle for off-axis...

Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C359S350000, C430S005000

Reexamination Certificate

active

09784800

ABSTRACT:
An apparatus and method for optimizing a pellicle for off-axis transmission are disclosed. A pellicle includes a thin film optimized for transmission of off-axis incident light at a desired angle. The pellicle further includes an optical thickness greater than a design thickness by less than or equal to approximately one-quarter of an exposure wavelength.

REFERENCES:
patent: 4657805 (1987-04-01), Fukumitsu et al.
patent: 4966457 (1990-10-01), Hayano et al.
patent: 5061024 (1991-10-01), Keys
patent: 5073018 (1991-12-01), Kino et al.
patent: 5339197 (1994-08-01), Yen
patent: 5368675 (1994-11-01), Hamada et al.
patent: 5741576 (1998-04-01), Kuo
patent: 5742386 (1998-04-01), Nose et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for optimizing a pellicle for off-axis... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for optimizing a pellicle for off-axis..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for optimizing a pellicle for off-axis... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3736151

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.