Apparatus and method for optical-based flux monitoring of an eff

Details Apparatus and method for optical-based flux monitoring of an eff Apparatus and method for optical-based flux monitoring of an eff

1995-06-07

1997-01-28

McGraw, Vincent P.

Optics: measuring and testing

With plural diverse test or art

117 85, 117 86, 117202, G01N 2131

Patent

active

055982603

ABSTRACT:
An apparatus and method for optically monitoring the output of an effusion cell during the MBE process where resonant radiation is guided through an optical radiation guide across the output orifice of the effusion cell to determine the atomic flux according to the concentration and absorbance of the resonant radiation at the output orifice of the effusion cell.

REFERENCES:
patent: 4381894 (1983-05-01), Gogol, Jr. et al.
S. A. Chalmers and K. P. Killeen, "Real-Time Control of Molecular Beam Epitaxy by Optical-Based Flux Monitoring," App. Phys. Lett., vol. 63, No. 23, Dec., 1993, pp. 3131-3133.
Chih-shun Lu, "Atomic Absorption Spectroscopy for Deposition Rate Monitoring," excerpt, Handbook of Thin Film Process Technology, Inst. of Phys. Pub., Bristol and Phil., 1995.

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