Apparatus and method for monitoring and controlling an ion impla

Details Apparatus and method for monitoring and controlling an ion impla Apparatus and method for monitoring and controlling an ion impla

1993-01-28

1995-12-12

Ramirez, Ellis B.

Boots, shoes, and leggings

36455101, 364552, G01B 1500

Patent

active

054756189

ABSTRACT:
An improved ion implant device is provided having programmable and graphical user interface. The ion implant device can be accessed by a remote computer such as an IBM.RTM.-compatible PC/XT/AT personal computer to allow an operator to access, control and monitor the implant device from a remote location. Various control signals associated with implant operation can be changed or modified according to implant parameters stored within the computer. Each time a wafer lot is to be processed, the implant parameters can be quickly retrieved from the computer and read to the implant device with minimum operator error. Likewise, various implant parameters and/or implanter settings can be written to the computer and stored within the computer's memory. The computer can be easily interfaced or retrofitted to existing implant devices with only a minimum amount of necessary software code and associated hardware.

REFERENCES:
patent: 3863226 (1975-01-01), Ryburn
patent: 4447804 (1984-05-01), Allen
patent: 4469945 (1984-09-01), Hoeberechts et al.
patent: 4531191 (1985-07-01), Koyama
patent: 4603320 (1986-07-01), Farago
patent: 4728930 (1988-03-01), Grote et al.
patent: 4743806 (1988-05-01), Gyulai et al.
patent: 4748668 (1988-05-01), Shamir et al.
patent: 4967381 (1990-10-01), Lane et al.
patent: 5083117 (1992-01-01), Holgaard
patent: 5091655 (1992-02-01), Dykstra et al.
patent: 5132545 (1992-07-01), Shono et al.
patent: 5144142 (1992-09-01), Fueki et al.
patent: 5149976 (1992-09-01), Sipma
patent: 5244820 (1993-09-01), Kamata et al.
patent: 5281827 (1994-01-01), Kawano et al.

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