Apparatus and method for microwave plasma process

Details Apparatus and method for microwave plasma process Apparatus and method for microwave plasma process

1998-10-13

2000-06-20

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723MR, 118723R, 118723MA, 20429838, 20429837, C23C 1600

Patent

active

060764848

ABSTRACT:
The invention provides a microwave plasma process apparatus in which an antenna having a tubular member curved in a C shape or a spiral shape and including a slit is disposed on a sealing member for sealing a chamber, so that a microwave can be emitted through the slit to the sealing member.

REFERENCES:
patent: 5359177 (1994-10-01), Taki et al.

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