Optics: measuring and testing – By light interference – Using fiber or waveguide interferometer
Reexamination Certificate
2007-12-04
2007-12-04
Connolly, Patrick (Department: 2877)
Optics: measuring and testing
By light interference
Using fiber or waveguide interferometer
C356S504000
Reexamination Certificate
active
09471829
ABSTRACT:
A thin film thickness measurement apparatus that can measure immediately after film growth thickness of a thin film of a substrate that is grown includes a light receiving/projecting unit directing light substantially perpendicular to the substrate and receiving light reflected from the substrate, and an analyze unit analyzing thickness of a thin film of the substrate according to intensity of reflected light received by the light receiving/projecting unit.
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Korean Patent Office Action (Notice of Ground of Rejection).
Office Action and English language translation of the Office Action. The Office Action was mailed on Sep. 28, 2004 in connection with the counterpart Japanese Patent Application No. H11-195925.
Japanese Patent Office Action mailed Mar. 22, 2005 and English Translation.
Korean Patent Office Action (Notice of ground of Rejection) 2005.
Korean Patent Office Action (Notice Of Ground Of Rejection).
Hatanaka Masatsugu
Tagusa Yasunobu
Tanaka Junichi
Tanigawa Toru
Conlin David G.
Connolly Patrick
Edwards Angell Palmer & & Dodge LLP
Jensen Steven M.
Sharp Kabushiki Kaisha
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