Apparatus and method for measuring the temperature of...

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Reexamination Certificate

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C219S405000, C219S411000, C392S416000, C392S418000, C118S724000, C374S121000, C374S123000, C374S126000, C250S492100, C250S50400H

Reexamination Certificate

active

06847012

ABSTRACT:
The invention relates to a device for measuring the temperature of substrates, notably semiconductor wafers. The device comprises at least one radiation sensor for measuring the radiation emitted by the substrate and an element (19) which restricts the field of vision of the radiation sensor and is positioned between the substrate and the radiation sensor. The substrate temperature can be determined correctly and simply, even if the substrate vibrates or is tilting, owing to the fact that the edges (20) of the element extend in a straight line. The invention also relates to a corresponding method.

REFERENCES:
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patent: 5061084 (1991-10-01), Thompson et al.
patent: 5226732 (1993-07-01), Nakos et al.
patent: 5359693 (1994-10-01), Nenyei et al.
patent: 5442727 (1995-08-01), Fiory
patent: 5624590 (1997-04-01), Fiory
patent: 5628564 (1997-05-01), Nenyei et al.
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patent: 21 50 963 (1972-04-01), None
patent: 4012615 (1991-10-01), None
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patent: 42 23 133 (1993-01-01), None
patent: 44 14 391 (1995-11-01), None
patent: 44 37 361 (1996-04-01), None
patent: WO 9400744 (1994-01-01), None
Patent Abstracts of Japan 5-187922(A).

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