X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1997-11-07
1999-12-21
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 70, G01N 23201
Patent
active
06005915&
ABSTRACT:
An apparatus and method are present which use X-ray fluorescence techniques to determine the roughness of a target surface. The apparatus includes an X-ray source and an X-ray detector. The X-ray source produces primary X-ray photons formed into a primary X-ray beam, and the primary X-ray beam is directed to and incident upon the target surface. The X-ray detector is positioned to receive primary X-ray photons scattered by the target surface. A fraction of the primary X-ray photons scattered by the target surface is directly proportional to the roughness of the target surface. The roughness of the target surface is determined from the number of primary X-ray photons scattered by the target surface and received by the X-ray detector within a predetermined exposure time. The X-ray detector produces an output signal proportional to the energy levels of received X-ray photons. An energy range of interest is divided into segments. A computer system receives the X-ray detector output signals and increments corresponding counts associated with segments of the energy range of interest. Following exposure, the computer system produces a graph of the counts associated with each segment. The computer system also reviews the counts associated with a peak in the graph corresponding to the energy levels of the scattered primary X-ray photons, determines selected characteristics of the peak (e.g., a maximum count associated with the peak, the area under the peak, etc.), and uses calibration data to compute a surface roughness value.
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Hossain Tim Z.
Stanford Joel R.
Tiffin Donald A.
Advanced Micro Devices , Inc.
Church Craig E.
Daffer Kevin L.
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