Apparatus and method for measuring the amount of gas adsorbed on

Details Apparatus and method for measuring the amount of gas adsorbed on Apparatus and method for measuring the amount of gas adsorbed on

1990-04-17

1994-08-30

Warden, Robert J.

Chemical apparatus and process disinfecting, deodorizing, preser

Analyzer, structured indicator, or manipulative laboratory...

Means for analyzing gas sample

422 88, 436 34, 436 37, 436147, 436148, 73 73, G01N 702

Patent

active

053425804

ABSTRACT:
An apparatus and method for measuring an amount of gas adsorbed on or desorbed from a solid and for analyzing and surveying reactions of a gas with a solid. Governing parameters include pressure, temperature and gas flow rate. The apparatus and method provide accurate measurement utilizing temperature programmed characterization and the volumetric method. The method is useful at both very high and very low pressures.

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