Apparatus and method for measuring strain within a structure

Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters

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324687, 73862626, G01R 2726

Patent

active

059364114

ABSTRACT:
A method and apparatus for measuring displacement of one location of a structure, relative to another, spaced apart location. The apparatus includes a first array of conductive elements disposed on the structure and attached at said one location; a second array of conductive elements disposed on the structure adjacent the first array and attached at said other, spaced-apart location such that displacement of said one location with respect to said other, spaced-apart location can be measured by measuring the first array position with respect to the second array position; a source for supplying an electric current to the first and the second array of conductive elements to develop a unique charge between each conductive element of the first array and each respective conductive element of the second array, wherein the unique charge that is stored between each pair of conductive elements changes when the relative position of the first array changes with respect to the second array and the change in charges corresponds to the displacement of the one location with respect to the other, spaced apart location.

REFERENCES:
patent: 4733235 (1988-03-01), Baer et al.
patent: 4743902 (1988-05-01), Andermo
patent: 5237284 (1993-08-01), Van Der Valk
patent: 5304937 (1994-04-01), Meyer
patent: 5461320 (1995-10-01), Strack et al.

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