Apparatus and method for measuring micro-resistivity anisotropy

Electricity: measuring and testing – Of geophysical surface or subsurface in situ – Using electrode arrays – circuits – structure – or supports

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C702S007000, C702S011000

Reexamination Certificate

active

07609066

ABSTRACT:
A method for measuring anisotropy in thin-bed formations calls for placing a logging tool into a borehole in the formation and applying current to at least one set of injection electrodes and at least one set of return electrodes to measure resistivity in the formation. Resistivity measurements are used to determine aspects of thin-bed formations exposed in the borehole to the tool. The aspects include the formation azimuth angle (Θ) and the formation dip angle (θ). Typically, the measurements and determinations are completed using apparatus including a computer program product.

REFERENCES:
patent: 2930969 (1960-03-01), Baker
patent: 3076138 (1963-01-01), Stelzer
patent: 4468623 (1984-08-01), Gianzero et al.
patent: 5502686 (1996-03-01), Dory et al.
patent: 5850624 (1998-12-01), Gard et al.
patent: 6191588 (2001-02-01), Chen
patent: 6342784 (2002-01-01), Wollin
patent: 6348796 (2002-02-01), Evans et al.
patent: 6765386 (2004-07-01), Gianzero et al.
patent: 2003/0197510 (2003-10-01), Gianzero et al.
patent: 2003/0222651 (2003-12-01), Tabanou
patent: 2004/0051531 (2004-03-01), Chemali et al.
patent: 2005/0088181 (2005-04-01), Barber et al.
patent: 2005/0242819 (2005-11-01), Gold et al.
patent: 2005/0264295 (2005-12-01), Strack et al.
patent: 2006/0290354 (2006-12-01), Fredette et al.
patent: 2007/0007967 (2007-01-01), Itskovich et al.
patent: 2007/0030008 (2007-02-01), Cheung et al.
patent: 2007/0216417 (2007-09-01), Ritter et al.
patent: 685727 (1960-05-01), None
patent: WO 2005006023 (2005-01-01), None
Horn, et al. Matrix Analysis. Feb. 23, 1990. pp. 23-24.
International Search Report for International application No. PCT/US07/10673. Mailed. Feb. 20, 2008. Date of Publication Apr. 10, 2008.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for measuring micro-resistivity anisotropy does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for measuring micro-resistivity anisotropy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for measuring micro-resistivity anisotropy will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4064552

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.