Apparatus and method for measurement of critical dimensions...

Details Apparatus and method for measurement of critical dimensions... Apparatus and method for measurement of critical dimensions...

2008-03-18

2008-03-18

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S516000

Reexamination Certificate

active

11124603

ABSTRACT:
Methods and apparatus are disclosed for measurement of critical dimensions (CD) of features and detection of defects in reflecting UV, VUV, and EUV lithography masks and in transmitting UV and VUV lithography masks. The measured CD's may be used in the determination of optical proximity corrections (OPC) and/or in mask fabrication process control. The transmitting masks may comprise binary and various types of phase shift masks.

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