Apparatus and method for manufacturing semiconductor device,...

Details Apparatus and method for manufacturing semiconductor device,... Apparatus and method for manufacturing semiconductor device,...

2006-03-27

2011-10-11

Kackar, Ram (Department: 1716)

Coating apparatus

Gas or vapor deposition

C118S7230AN, C156S345290, C438S638000, C438S715000

Reexamination Certificate

active

08034175

ABSTRACT:
A method for manufacturing a semiconductor device, comprises providing a semiconductor layer deposited on a substrate with heat treatment by using a flame of a gas burner fueled by a hydrogen-and-oxygen mixed gas as a heat source.

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Higashi et al., “Crystallization of Si Thin Film Using Thermal Plasma Jet and Its Application to Thin-Film Transistor Fabrication,” AM-LCD, Technical Digest Papers, 2004.

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