Apparatus and method for manufacturing photosensitive amorphous

Details Apparatus and method for manufacturing photosensitive amorphous Apparatus and method for manufacturing photosensitive amorphous

1987-12-09

1989-07-25

Morgenstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 74, 118730, B05D 306, B05D 512, C23C 1600

Patent

active

048512567

ABSTRACT:
An apparatus for manufacturing photosensitive amorphous silicon objects comprises a pair of coaxial cylindrical electrodes inside a reaction tank of a plasma CVD device. A plurality of cylindrical substrates of an electrically conductive material disposed between these electrodes. A source gas is injected into the reaction tank through a plurality of inlets evenly spaced on the outer peripheral wall so that films of uniform quality can be produced efficiently.

REFERENCES:
patent: 4466380 (1984-08-01), Jansen
patent: 4501766 (1985-02-01), Suzuki
patent: 4612207 (1986-09-01), Jansen
patent: 4676195 (1987-06-01), Yasui et al.

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