Apparatus and method for laser-induced chemical vapor deposition

Coating processes – Electrical product produced – Welding electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118620, 118641, 118725, 427 55, B05D 306

Patent

active

045812489

ABSTRACT:
This invention relates to apparatus and methods for laser induced vapor deposition upon a substrate. The invention includes apparatus isolated from the deposition chamber for preheating the substrate before deposition. A bellows arrangement permits adjustment of the heat applied to the substrate.

REFERENCES:
patent: 3271180 (1966-09-01), White
patent: 3364087 (1968-01-01), Solomon et al.
patent: 3661637 (1972-05-01), Sirtl
patent: 3761677 (1973-09-01), Mitzutani
patent: 4059461 (1977-11-01), Fan et al.
patent: 4260649 (1981-04-01), Dension et al.
patent: 4340617 (1982-07-01), Devtsch et al.
patent: 4343829 (1982-08-01), Tochikubo et al.
patent: 4363828 (1982-12-01), Brodsky et al.
patent: 4371587 (1983-02-01), Peters
patent: 4421479 (1983-12-01), Muka et al.
Boyer et al., "Microelectronic Thin Film Deposition by UV Laser Photolysis" Proc. Soc. of Photo-Instrumentation Eng., Jan. 1983.
Semiconductor International, Sep. 1983, pp. 17, 18.
Boyer et al., App. Phys. Lett., vol. 40, No. 8, Apr. 1982, pp. 716-719.
Industrial Chemical Industries Ltd. "Notes on Drying Paints by Radiant Heat", pp. 12-14.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for laser-induced chemical vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for laser-induced chemical vapor deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for laser-induced chemical vapor deposition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2065363

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.