Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-11-29
1995-08-15
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
20415722, 117904, C23C 1600
Patent
active
054415691
ABSTRACT:
Method and apparatus for depositing durable coatings onto the surface of a substrate without heating the entire substrate to high temperatures by using lasers to heat the substrate and dissociate a deposition gas. The apparatus comprises a deposition chamber for enclosing the substrate upon which a coating is to be deposited, gas delivery means for directing a flow of deposition gas on the substrate, a first laser for heating the substrate, and a second laser for irradiating the deposition gas to dissociate the gas. The method includes placing a substrate within a vacuum deposition chamber and directing a flow of deposition gas on the substrate. Then the substrate is heated with a first laser while the deposition gas is irradiated with a second laser to dissociate the deposition gas.
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patent: 5207878 (1993-05-01), Shimo
Barletta Robert E.
Vanier Peter
Veligdan James T.
Anderson Thomas G.
Breneman R. Bruce
Chang Joni Y.
Moser William R.
Park Daniel D.
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