Apparatus and method for intra process on wafer monitoring of de

Details Apparatus and method for intra process on wafer monitoring of de Apparatus and method for intra process on wafer monitoring of de

1996-08-06

1998-01-20

Snow, Walter E.

Electricity: measuring and testing

Magnetic

Magnetic information storage element testing

324235, 324239, 2960309, G01R 3312, G01N 2772, G11B 5127, H01F 706

Patent

active

057105103

ABSTRACT:
A monitoring apparatus is provided for determining permeabilities of a vacuum-deposited second pole piece of a magnetic head at the wafer level by providing wafer-mounted monitors which have layers formed by the same masking and deposition steps employed in making the magnetic heads so that the layers of the monitors are replicated layers, except for a shaping layer on top of a replicated second pole piece of some of the monitors. Each monitor is a transformer wherein each of a primary winding and a secondary winding comprises essentially a replicated magnetic head. The first and second pole pieces of the replicated magnetic heads are joined so as to magnetically couple the primary and secondary windings that constitute the transformer. The replicated shaping layer is omitted in part to expose a portion of one of the replicated second pole pieces of a monitor, such as the front slope, the back slope or the yoke portion of the replicated second pole piece which corresponds to the front slope, the back slope or yoke respectively of the magnetic head. When a current is conducted through the replicated coils of the monitor a voltage reading can be taken to indicate the permeability of the exposed portion of the replicated second pole piece of the monitor.

REFERENCES:
patent: 3336154 (1967-08-01), Oberg et al.
patent: 5393557 (1995-02-01), Darling, Jr.

Affiliated with

Also associated with

Rating

Apparatus and method for intra process on wafer monitoring of de does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for intra process on wafer monitoring of de, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for intra process on wafer monitoring of de will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-728521