Apparatus and method for inspection of a wafer

Details Apparatus and method for inspection of a wafer Apparatus and method for inspection of a wafer

2007-12-11

2007-12-11

Nguyen, Sang H. (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S601000, C250S458100

Reexamination Certificate

active

11011095

ABSTRACT:
The invention concerns an apparatus and a method for inspection of a wafer.The apparatus encompasses at least one stroboscopic incident-light illumination device for emitting a pulsed illuminating light beam onto a surface of the wafer and for illuminating a region on the surface of the wafer; and having [sic] at least one image acquisition device for acquiring an image of the respectively illuminated region on the surface of the wafer. The apparatus is characterized, according to the present invention, in that by at least one photodetection device for sensing light of the respective illuminating light beam, and a control device for controlling an image acquisition operation on the basis of the light sensed by the photodetection device, are provided.Intensity fluctuations of the light flashes of the incident-light illumination device are compensated for either by normalizing image data of the illuminated region or by controlling the duration of the light flashes.

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