Apparatus and method for inspecting pattern

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C382S147000, C382S168000, C348S128000, C356S237200

Reexamination Certificate

active

10434105

ABSTRACT:
An inspection apparatus (1) has an image pickup part (2) for performing an image pickup of a substrate (9), an operation part (4) to which an image signal is inputted from said image pickup part (2) and a computer (5), and the operation part (4) specifies an inspection image and a reference image from an object image acquired by the image pickup part (2). In the operation part (4), a region class to which each pixel of the specified inspection image belongs is specified on the basis of a corresponding pixel value of the reference image. In a comparator circuit of the operation part (4), a differential absolute value between each pixel of the inspection image and a corresponding pixel of the reference image is calculated and the differential absolute value is compared with a defect check threshold value in accordance with the specified region class, to perform defect check. The inspection apparatus (1) can thereby appropriately detect a defect in accordance with the region class to which each pixel belongs.

REFERENCES:
patent: 4574393 (1986-03-01), Blackwell et al.
patent: 5355212 (1994-10-01), Wells et al.
patent: 5638465 (1997-06-01), Sano et al.
patent: 5949905 (1999-09-01), Nichani et al.
patent: 5963661 (1999-10-01), Kato et al.
patent: 6621571 (2003-09-01), Maeda et al.
patent: 6674890 (2004-01-01), Maeda et al.
patent: 6697517 (2004-02-01), Hunter
patent: 4-78854 (1992-03-01), None
patent: 4-310852 (1992-11-01), None
patent: 4-316346 (1992-11-01), None
patent: 10-171996 (1998-06-01), None
patent: 2000-113189 (2000-04-01), None
patent: 2000-283929 (2000-10-01), None
patent: P2002-22421 (2002-01-01), None
Japanese Office Action issued in corresponding Japanese Patent Application No. JP 2002-168054, dated Feb. 21, 2007.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for inspecting pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for inspecting pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for inspecting pattern will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3769902

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.