X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1995-04-21
1996-12-24
Wong, Don
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 70, 378147, G01N 23207
Patent
active
055880347
ABSTRACT:
An apparatus for inspecting single crystal specimens comprises an x-ray generator which supplies x-rays to a collimator. The collimator has a matrix of apertures to produce a plurality of parallel x-ray beams which are directed onto a surface of the specimen. An x-ray detector detects the x-ray beams diffracted from the surface of the specimen, corresponding to each of the parallel x-ray beams. At each symmetry pole of an overall Laue pattern an accurately predictable pattern of spots is produced on the x-ray detector, if the orientation and shape of the specimen crystal is known. Each spot corresponds to where one of the diffracted beams strikes the detector. A disarrangement of one or more of the spots indicates a difference in crystal orientation.
REFERENCES:
patent: 3883810 (1974-09-01), Efanov et al.
Bowen David K.
Thomas Charles R.
Rolls-Royce plc
University of Warwick
Wong Don
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