Apparatus and method for inline removal of impurities from wet c

Details Apparatus and method for inline removal of impurities from wet c Apparatus and method for inline removal of impurities from wet c

1998-06-30

2000-01-25

Therkorn, Ernest G.

Liquid purification or separation

Combined

210263, 2105021, 21050034, B01D 1508

Patent

active

060174536

ABSTRACT:
An apparatus and method for purifying semiconductor silicon wafer processing chemicals in line, the apparatus comprising a non-reactive chemical support, and a crown ether polymer covalently bonded to said non-reactive support, is disclosed. In operation, the crown ether polymer contained within the housing is positioned in-line with a wet chemical recirculation line, transfill system or distribution system.

REFERENCES:
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patent: 5200041 (1993-04-01), Simonet
patent: 5302729 (1994-04-01), Gibson
patent: 5426944 (1995-06-01), Li
patent: 5766478 (1998-06-01), Smith
patent: 5865994 (1999-02-01), Riviello
Zhao and Bartsch, Journal of Polymer Science, No. 33, pp. 2267-2274 (1995).

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